DeForest. (1975). Photoresist: Materials and processes. McGraw-Hill.
Chicago Style (17th ed.) CitationDeForest. Photoresist: Materials and Processes. New York: McGraw-Hill, 1975.
MLA (8th ed.) CitationDeForest. Photoresist: Materials and Processes. McGraw-Hill, 1975.
Warning: These citations may not always be 100% accurate.