Fabrication of silicon nanopillar sheet for Cell Culture Dish
This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopilla...
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Trans Tech Publications, Switzerland
2011
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iium-22812013-06-27T07:35:20Z http://irep.iium.edu.my/2281/ Fabrication of silicon nanopillar sheet for Cell Culture Dish Ali, Mohammad Yeakub Mohd Fuad, Nurul Hajar TJ Mechanical engineering and machinery TS Manufactures This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopillars ranges from 1 to 5.5 μm with aspect ratio of 1-6. Empirical relationship of taper angle, aspect ratio and height of the nanopillar were established. Taper angle was found to be reduced as the height of the nanopillar increased. The taper angle of nanopillars depends on the acceleration voltage, probe current and dwell time. Trans Tech Publications, Switzerland 2011-06-30 Article PeerReviewed application/pdf en http://irep.iium.edu.my/2281/1/AMR_2011_Vol_264-265__1352-1356.pdf Ali, Mohammad Yeakub and Mohd Fuad, Nurul Hajar (2011) Fabrication of silicon nanopillar sheet for Cell Culture Dish. Advanced Materials Research, 264. pp. 1352-1356. ISSN 1022-6680 http://www.scientific.net doi:10.4028/www.scientific.net/AMR.264-265.1352 |
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TJ Mechanical engineering and machinery TS Manufactures |
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TJ Mechanical engineering and machinery TS Manufactures Ali, Mohammad Yeakub Mohd Fuad, Nurul Hajar Fabrication of silicon nanopillar sheet for Cell Culture Dish |
description |
This paper discusses the fabrication of nanopillars using focused ion beam (FIB) sputtering. A 25 keV Ga+ FIB was used to machine the nanopillars. A reversed bitmap method was used to fabricate nanopillars where it milled the substrate all over except the nanopillar area. The height of the nanopillars ranges from 1 to 5.5 μm with aspect ratio of 1-6. Empirical relationship of taper angle, aspect ratio and height of the nanopillar were established. Taper angle was found to be reduced as the height of the nanopillar increased. The taper angle of nanopillars depends on the acceleration voltage, probe current and dwell time. |
format |
Article |
author |
Ali, Mohammad Yeakub Mohd Fuad, Nurul Hajar |
author_facet |
Ali, Mohammad Yeakub Mohd Fuad, Nurul Hajar |
author_sort |
Ali, Mohammad Yeakub |
title |
Fabrication of silicon nanopillar sheet for Cell Culture Dish |
title_short |
Fabrication of silicon nanopillar sheet for Cell Culture Dish |
title_full |
Fabrication of silicon nanopillar sheet for Cell Culture Dish |
title_fullStr |
Fabrication of silicon nanopillar sheet for Cell Culture Dish |
title_full_unstemmed |
Fabrication of silicon nanopillar sheet for Cell Culture Dish |
title_sort |
fabrication of silicon nanopillar sheet for cell culture dish |
publisher |
Trans Tech Publications, Switzerland |
publishDate |
2011 |
url |
http://irep.iium.edu.my/2281/ http://irep.iium.edu.my/2281/ http://irep.iium.edu.my/2281/ http://irep.iium.edu.my/2281/1/AMR_2011_Vol_264-265__1352-1356.pdf |
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2023-09-18T20:09:50Z |
last_indexed |
2023-09-18T20:09:50Z |
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