Sidewall surface roughness of Sputtered Silicon 1: surface modelling

Mathematical models for the calculation of sidewall surface roughness have been developed for focused ion beam (FIB) sputtering. The surface roughness profile at the sidewall was different to the bottom surface profile for the same sputtering parameters and substrate material. The cumulative sp...

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Main Authors: Ali, Mohammad Yeakub, Hung, N. P., Ngoi, B. K. A., Yuan, S.
Format: Article
Language:English
Published: Maney Publishing 2003
Subjects:
Online Access:http://irep.iium.edu.my/27107/
http://irep.iium.edu.my/27107/1/019_SE1_9%282%29_097-103.pdf
id iium-27107
recordtype eprints
spelling iium-271072013-05-09T05:29:14Z http://irep.iium.edu.my/27107/ Sidewall surface roughness of Sputtered Silicon 1: surface modelling Ali, Mohammad Yeakub Hung, N. P. Ngoi, B. K. A. Yuan, S. TS Manufactures Mathematical models for the calculation of sidewall surface roughness have been developed for focused ion beam (FIB) sputtering. The surface roughness profile at the sidewall was different to the bottom surface profile for the same sputtering parameters and substrate material. The cumulative sputtering by the Gaussian beam creates a steady state surface profile at the sidewall which has been used to develop surface roughness models. The ion intensity distribution profile was considered to be Gaussian. The beam function includes ion type, ion acceleration voltage, beam radius, tailing and neighbouring of the successive beams. Knowing the beam radius and pixel spacing, sidewall surface roughness of FIB sputtered microfeatures can be calculated using these models. The substrate material function has no direct effect on the sidewall surface profile if the same material is used for the study of beam profile and fabrication of microfeatures. Maney Publishing 2003 Article PeerReviewed application/pdf en http://irep.iium.edu.my/27107/1/019_SE1_9%282%29_097-103.pdf Ali, Mohammad Yeakub and Hung, N. P. and Ngoi, B. K. A. and Yuan, S. (2003) Sidewall surface roughness of Sputtered Silicon 1: surface modelling. Surface Engineering, 19 (2). pp. 97-103. ISSN 0267-0844
repository_type Digital Repository
institution_category Local University
institution International Islamic University Malaysia
building IIUM Repository
collection Online Access
language English
topic TS Manufactures
spellingShingle TS Manufactures
Ali, Mohammad Yeakub
Hung, N. P.
Ngoi, B. K. A.
Yuan, S.
Sidewall surface roughness of Sputtered Silicon 1: surface modelling
description Mathematical models for the calculation of sidewall surface roughness have been developed for focused ion beam (FIB) sputtering. The surface roughness profile at the sidewall was different to the bottom surface profile for the same sputtering parameters and substrate material. The cumulative sputtering by the Gaussian beam creates a steady state surface profile at the sidewall which has been used to develop surface roughness models. The ion intensity distribution profile was considered to be Gaussian. The beam function includes ion type, ion acceleration voltage, beam radius, tailing and neighbouring of the successive beams. Knowing the beam radius and pixel spacing, sidewall surface roughness of FIB sputtered microfeatures can be calculated using these models. The substrate material function has no direct effect on the sidewall surface profile if the same material is used for the study of beam profile and fabrication of microfeatures.
format Article
author Ali, Mohammad Yeakub
Hung, N. P.
Ngoi, B. K. A.
Yuan, S.
author_facet Ali, Mohammad Yeakub
Hung, N. P.
Ngoi, B. K. A.
Yuan, S.
author_sort Ali, Mohammad Yeakub
title Sidewall surface roughness of Sputtered Silicon 1: surface modelling
title_short Sidewall surface roughness of Sputtered Silicon 1: surface modelling
title_full Sidewall surface roughness of Sputtered Silicon 1: surface modelling
title_fullStr Sidewall surface roughness of Sputtered Silicon 1: surface modelling
title_full_unstemmed Sidewall surface roughness of Sputtered Silicon 1: surface modelling
title_sort sidewall surface roughness of sputtered silicon 1: surface modelling
publisher Maney Publishing
publishDate 2003
url http://irep.iium.edu.my/27107/
http://irep.iium.edu.my/27107/1/019_SE1_9%282%29_097-103.pdf
first_indexed 2023-09-18T20:40:18Z
last_indexed 2023-09-18T20:40:18Z
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