Hung, N., Ali, M. Y., Fu, Y., Ong, N., & Tay, M. (2001). Surface integrity and removal rate of silicon sputtered with focused ion beam. Taylor and Francis Inc.
Chicago Style (17th ed.) CitationHung, NguyenPhu, Mohammad Yeakub Ali, Yongqi Fu, NanShing Ong, and MengLeong Tay. Surface Integrity and Removal Rate of Silicon Sputtered with Focused Ion Beam. Taylor and Francis Inc, 2001.
MLA (8th ed.) CitationHung, NguyenPhu, et al. Surface Integrity and Removal Rate of Silicon Sputtered with Focused Ion Beam. Taylor and Francis Inc, 2001.
Warning: These citations may not always be 100% accurate.