Development of low normal force contact using electro fine forming and lithography technology

This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at...

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Main Authors:	Bhuiyan, Moinul, Yamada, Shinji, Kurokawa, Noriharu, Sakamoto, Katsuhiko, Takemasa, Eiichiro
Format:	Conference or Workshop Item
Language:	English English
Published:	2008
Subjects:	TA401 Materials of engineering and construction
Online Access:	http://irep.iium.edu.my/33190/ http://irep.iium.edu.my/33190/ http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg

id	iium-33190
recordtype	eprints
spelling	iium-331902013-12-20T07:34:23Z http://irep.iium.edu.my/33190/ Development of low normal force contact using electro fine forming and lithography technology Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro TA401 Materials of engineering and construction This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50mΩ). 2008-10 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf application/pdf en http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg Bhuiyan, Moinul and Yamada, Shinji and Kurokawa, Noriharu and Sakamoto, Katsuhiko and Takemasa, Eiichiro (2008) Development of low normal force contact using electro fine forming and lithography technology. In: Tyco Electronics Technical Conference 2008, 14-16 Oct 2008, Shanghai, China. (Unpublished) http://www.te.com/en/home.html
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English English
topic	TA401 Materials of engineering and construction
spellingShingle	TA401 Materials of engineering and construction Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro Development of low normal force contact using electro fine forming and lithography technology
description	This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50mΩ).
format	Conference or Workshop Item
author	Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro
author_facet	Bhuiyan, Moinul Yamada, Shinji Kurokawa, Noriharu Sakamoto, Katsuhiko Takemasa, Eiichiro
author_sort	Bhuiyan, Moinul
title	Development of low normal force contact using electro fine forming and lithography technology
title_short	Development of low normal force contact using electro fine forming and lithography technology
title_full	Development of low normal force contact using electro fine forming and lithography technology
title_fullStr	Development of low normal force contact using electro fine forming and lithography technology
title_full_unstemmed	Development of low normal force contact using electro fine forming and lithography technology
title_sort	development of low normal force contact using electro fine forming and lithography technology
publishDate	2008
url	http://irep.iium.edu.my/33190/ http://irep.iium.edu.my/33190/ http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg
first_indexed	2023-09-18T20:47:57Z
last_indexed	2023-09-18T20:47:57Z
_version_	1777409801800646656

Development of low normal force contact using electro fine forming and lithography technology

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