A low normal force contact using photolithography and Ni-Co electro fine forming technology

This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0....

Full description

Bibliographic Details
Main Authors:	Bhuiyan , Moinul, Takemasa, Eiichiro
Format:	Conference or Workshop Item
Language:	English English
Published:	2009
Subjects:	TA165 Engineering instruments, meters, etc. Industrial instrumentation
Online Access:	http://irep.iium.edu.my/33437/ http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf

id	iium-33437
recordtype	eprints
spelling	iium-334372013-12-18T04:45:06Z http://irep.iium.edu.my/33437/ A low normal force contact using photolithography and Ni-Co electro fine forming technology Bhuiyan , Moinul Takemasa, Eiichiro TA165 Engineering instruments, meters, etc. Industrial instrumentation This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50m�). The particle size of the Ni-Co crystal must be less than 100nm as measured by STEM. 2009-05-14 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf application/pdf en http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf Bhuiyan , Moinul and Takemasa, Eiichiro (2009) A low normal force contact using photolithography and Ni-Co electro fine forming technology. In: TE-Japan Technical Conference, 14 May 2009, Kawasaki, Japan.
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English English
topic	TA165 Engineering instruments, meters, etc. Industrial instrumentation
spellingShingle	TA165 Engineering instruments, meters, etc. Industrial instrumentation Bhuiyan , Moinul Takemasa, Eiichiro A low normal force contact using photolithography and Ni-Co electro fine forming technology
description	This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at 0.3mm) at contact point (5μm radius), durability of 100,000 contact cycles (less than 50m�). The particle size of the Ni-Co crystal must be less than 100nm as measured by STEM.
format	Conference or Workshop Item
author	Bhuiyan , Moinul Takemasa, Eiichiro
author_facet	Bhuiyan , Moinul Takemasa, Eiichiro
author_sort	Bhuiyan , Moinul
title	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_short	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_full	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_fullStr	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_full_unstemmed	A low normal force contact using photolithography and Ni-Co electro fine forming technology
title_sort	low normal force contact using photolithography and ni-co electro fine forming technology
publishDate	2009
url	http://irep.iium.edu.my/33437/ http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf
first_indexed	2023-09-18T20:48:20Z
last_indexed	2023-09-18T20:48:20Z
_version_	1777409825198571520

A low normal force contact using photolithography and Ni-Co electro fine forming technology

Similar Items