Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices
We report the deposition of high quality c-axis oriented Aluminium doped Zinc Oxide (AZO) on silicon substrate for surface acoustic wave (SAW) applications. AZO thin film is prepared by Radio frequency magnetron sputtering method. Sputtering is a preferred method because it is able to perform deposi...
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| Format: | Conference or Workshop Item |
| Language: | English English |
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2015
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| Online Access: | http://irep.iium.edu.my/45282/ http://irep.iium.edu.my/45282/ http://irep.iium.edu.my/45282/1/45282.pdf http://irep.iium.edu.my/45282/4/45282_Dependence%20of%20preferred%20c-axis%20orientation_Scopus.pdf |
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iium-45282 |
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eprints |
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iium-452822017-09-21T08:09:50Z http://irep.iium.edu.my/45282/ Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices Md Ralib @ Md Raghib, Aliza 'Aini Nordin, Anis Nurashikin Abdul Malik, Noreha Othman, Raihan TK7800 Electronics. Computer engineering. Computer hardware. Photoelectronic devices We report the deposition of high quality c-axis oriented Aluminium doped Zinc Oxide (AZO) on silicon substrate for surface acoustic wave (SAW) applications. AZO thin film is prepared by Radio frequency magnetron sputtering method. Sputtering is a preferred method because it is able to perform deposition at low temperature, produce uniform thin film and possesses high deposition rates. In preserving the functionality of the device during post CMOS process, low deposition temperature is crucial. In order to obtain the preferred AZO structural properties with strong acoustoelectric interaction, we investigate the influence of RF power on c-axis preferred orientation of AZO/Si multilayer. The deposited thin films are characterized by X-Ray diffractometer and scanning electron microscopy (SEM). The crystal structures are evaluated in terms of c-axis lattice constant, d-spacing and crystallite size. It is observed that as RF power increases, the AZO film is predominantly oriented at c-axis (002) and achieved high crystalline quality. However, if the applied RF power is too high, the energized ions would impede the growth of high quality film. The optimum RF power was found to be at 250 W, at which the material exhibits hexagonal wurtzite-type lattice of ZnO structure, high crystallinity (lowest FWHM value) and crystallite size, and high deposition rate. 2015-04-27 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/45282/1/45282.pdf application/pdf en http://irep.iium.edu.my/45282/4/45282_Dependence%20of%20preferred%20c-axis%20orientation_Scopus.pdf Md Ralib @ Md Raghib, Aliza 'Aini and Nordin, Anis Nurashikin and Abdul Malik, Noreha and Othman, Raihan (2015) Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices. In: 2015 Symposium on Design, Integration, Test and Packaging of MEMS and MOEMS (DTIP), 27th-30th April 2015, Montpellier, France. http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7160990 |
| repository_type |
Digital Repository |
| institution_category |
Local University |
| institution |
International Islamic University Malaysia |
| building |
IIUM Repository |
| collection |
Online Access |
| language |
English English |
| topic |
TK7800 Electronics. Computer engineering. Computer hardware. Photoelectronic devices |
| spellingShingle |
TK7800 Electronics. Computer engineering. Computer hardware. Photoelectronic devices Md Ralib @ Md Raghib, Aliza 'Aini Nordin, Anis Nurashikin Abdul Malik, Noreha Othman, Raihan Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices |
| description |
We report the deposition of high quality c-axis oriented Aluminium doped Zinc Oxide (AZO) on silicon substrate for surface acoustic wave (SAW) applications. AZO thin film is prepared by Radio frequency magnetron sputtering method. Sputtering is a preferred method because it is able to perform deposition at low temperature, produce uniform thin film and possesses high deposition rates. In preserving the functionality of the device during post CMOS process, low deposition temperature is crucial. In order to obtain the preferred AZO structural properties with strong acoustoelectric interaction, we investigate the influence of RF power on c-axis preferred orientation of AZO/Si multilayer. The deposited thin films are characterized by X-Ray diffractometer and scanning electron microscopy (SEM). The crystal structures are evaluated in terms of c-axis lattice constant, d-spacing and crystallite size. It is observed that as RF power increases, the AZO film is predominantly oriented at c-axis (002) and achieved high crystalline quality. However, if the applied RF power is too high, the energized ions would impede the growth of high quality film. The optimum RF power was found to be at 250 W, at which the material exhibits hexagonal wurtzite-type lattice of ZnO structure, high crystallinity (lowest FWHM value) and crystallite size, and high deposition rate. |
| format |
Conference or Workshop Item |
| author |
Md Ralib @ Md Raghib, Aliza 'Aini Nordin, Anis Nurashikin Abdul Malik, Noreha Othman, Raihan |
| author_facet |
Md Ralib @ Md Raghib, Aliza 'Aini Nordin, Anis Nurashikin Abdul Malik, Noreha Othman, Raihan |
| author_sort |
Md Ralib @ Md Raghib, Aliza 'Aini |
| title |
Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices |
| title_short |
Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices |
| title_full |
Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices |
| title_fullStr |
Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices |
| title_full_unstemmed |
Dependence of preferred c-axis orientation on RF magnetron sputtering power for AZO/Si acoustic wave devices |
| title_sort |
dependence of preferred c-axis orientation on rf magnetron sputtering power for azo/si acoustic wave devices |
| publishDate |
2015 |
| url |
http://irep.iium.edu.my/45282/ http://irep.iium.edu.my/45282/ http://irep.iium.edu.my/45282/1/45282.pdf http://irep.iium.edu.my/45282/4/45282_Dependence%20of%20preferred%20c-axis%20orientation_Scopus.pdf |
| first_indexed |
2023-09-18T21:04:28Z |
| last_indexed |
2023-09-18T21:04:28Z |
| _version_ |
1777410840630132736 |