Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate

Memristor has become one of the alternatives to replace the current memory technologies. Fabrication of titanium dioxide, TiO2 memristor has been extensively studied by using various deposition methods. However, recently more researches have been done to explore the compatibility of other transitio...

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Main Authors:	Fauzi, Fatin Bazilah, Ani, Mohd Hanafi, Herman, Sukreen Hana, Mohamed, Mohd Ambri
Format:	Conference or Workshop Item
Language:	English English
Published:	IOP Publishing Ltd. 2018
Subjects:	T Technology (General) TA401 Materials of engineering and construction
Online Access:	http://irep.iium.edu.my/63444/ http://irep.iium.edu.my/63444/ http://irep.iium.edu.my/63444/ http://irep.iium.edu.my/63444/1/paper%20fatin%20memristor%20kt%20sarawak.pdf http://irep.iium.edu.my/63444/7/63444_Dilute%20electrodeposition%20of%20TiO2%20and%20ZnO%20thin%20film%20memristors%20on%20Cu%20substrate_SCOPUS.pdf

id	iium-63444
recordtype	eprints
spelling	iium-634442018-06-26T08:03:03Z http://irep.iium.edu.my/63444/ Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate Fauzi, Fatin Bazilah Ani, Mohd Hanafi Herman, Sukreen Hana Mohamed, Mohd Ambri T Technology (General) TA401 Materials of engineering and construction Memristor has become one of the alternatives to replace the current memory technologies. Fabrication of titanium dioxide, TiO2 memristor has been extensively studied by using various deposition methods. However, recently more researches have been done to explore the compatibility of other transition metal oxide, TMO such as zinc oxide, ZnO to be used as the active layer of the memristor. This paper highlights the simple and easy-control electrodeposition to deposit titanium, Ti and zinc, Zn thin film at room temperature and subsequent thermal oxidation at 600 oC. Gold, Au was then sputtered as top electrode to create metal-insulator-metal, MIM sandwich of Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors. The structural, morphological and memristive properties were characterized using Field Emission Scanning Electron Microscopy, FESEM, X-Ray Diffraction, XRD and current-voltage, I-V measurement. Both Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristivity were identified by the pinched hysteresis loop with resistive ratio of 1.2 and 1.08 respectively. Empirical study on diffusivity of Ti4+, Zn2+ and O2- ions in both metal oxides show that the metal vacancies were formed, thus giving rise to its memristivity. The electrodeposited Au/TiO2-Cu2OCuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors demonstrate comparable performances to previous studies using other methods. IOP Publishing Ltd. 2018 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/63444/1/paper%20fatin%20memristor%20kt%20sarawak.pdf application/pdf en http://irep.iium.edu.my/63444/7/63444_Dilute%20electrodeposition%20of%20TiO2%20and%20ZnO%20thin%20film%20memristors%20on%20Cu%20substrate_SCOPUS.pdf Fauzi, Fatin Bazilah and Ani, Mohd Hanafi and Herman, Sukreen Hana and Mohamed, Mohd Ambri (2018) Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate. In: 6th International Conference on Electronic Devices, Systems and Applications 2017 (ICEDSA 2017), 8-9 August 2017, Kuching, Sarawak, Malaysia. http://iopscience.iop.org/article/10.1088/1757-899X/340/1/012006/pdf 10.1088/1757-899X/340/1/012006
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English English
topic	T Technology (General) TA401 Materials of engineering and construction
spellingShingle	T Technology (General) TA401 Materials of engineering and construction Fauzi, Fatin Bazilah Ani, Mohd Hanafi Herman, Sukreen Hana Mohamed, Mohd Ambri Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate
description	Memristor has become one of the alternatives to replace the current memory technologies. Fabrication of titanium dioxide, TiO2 memristor has been extensively studied by using various deposition methods. However, recently more researches have been done to explore the compatibility of other transition metal oxide, TMO such as zinc oxide, ZnO to be used as the active layer of the memristor. This paper highlights the simple and easy-control electrodeposition to deposit titanium, Ti and zinc, Zn thin film at room temperature and subsequent thermal oxidation at 600 oC. Gold, Au was then sputtered as top electrode to create metal-insulator-metal, MIM sandwich of Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors. The structural, morphological and memristive properties were characterized using Field Emission Scanning Electron Microscopy, FESEM, X-Ray Diffraction, XRD and current-voltage, I-V measurement. Both Au/TiO2-Cu2O-CuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristivity were identified by the pinched hysteresis loop with resistive ratio of 1.2 and 1.08 respectively. Empirical study on diffusivity of Ti4+, Zn2+ and O2- ions in both metal oxides show that the metal vacancies were formed, thus giving rise to its memristivity. The electrodeposited Au/TiO2-Cu2OCuO/Cu and Au/ZnO-Cu2O-CuO/Cu memristors demonstrate comparable performances to previous studies using other methods.
format	Conference or Workshop Item
author	Fauzi, Fatin Bazilah Ani, Mohd Hanafi Herman, Sukreen Hana Mohamed, Mohd Ambri
author_facet	Fauzi, Fatin Bazilah Ani, Mohd Hanafi Herman, Sukreen Hana Mohamed, Mohd Ambri
author_sort	Fauzi, Fatin Bazilah
title	Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate
title_short	Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate
title_full	Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate
title_fullStr	Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate
title_full_unstemmed	Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate
title_sort	dilute electrodeposition of tio2 and zno thin film memristors on cu substrate
publisher	IOP Publishing Ltd.
publishDate	2018
url	http://irep.iium.edu.my/63444/ http://irep.iium.edu.my/63444/ http://irep.iium.edu.my/63444/ http://irep.iium.edu.my/63444/1/paper%20fatin%20memristor%20kt%20sarawak.pdf http://irep.iium.edu.my/63444/7/63444_Dilute%20electrodeposition%20of%20TiO2%20and%20ZnO%20thin%20film%20memristors%20on%20Cu%20substrate_SCOPUS.pdf
first_indexed	2023-09-18T21:29:59Z
last_indexed	2023-09-18T21:29:59Z
_version_	1777412445922394112

Dilute electrodeposition of TiO2 and ZnO thin film memristors on Cu substrate

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