RF magnetron sputtered YSZ thin film: Fabrication and characterizations
In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method...
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iium-67202011-12-19T06:00:45Z http://irep.iium.edu.my/6720/ RF magnetron sputtered YSZ thin film: Fabrication and characterizations Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method. The thin films were deposited on carbon paint coated stainless steel foils with varying substrate temperatures (Ts) of 150, 200, 250 and 300°C, while other sputtering parameters i.e. argon gas flow rate, RF power and deposition time were fixed. The sputtering target was sintered YSZ pellets. The deposited thin films thickness ranges from 300 nm to 2 μm as determined from the scanning electron microscopy. Phase analysis using the X-ray diffraction (XRD) revealed monoclinic, tetragonal and cubic phases of zirconia, and yttria peaks. AC impedance spectroscopy was conducted to measure the bulk resistance of the thin films. Through increasing substrate temperatures, the bulk resistance decreases from 13.76 k for Ts of 150C to 1.913 k for Ts of 300C. 2010-06-14 Conference or Workshop Item NonPeerReviewed application/pdf en http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf Meskon, Shahrul Razi and Sutjipto, Agus Geter Edy and Ani, Mohd Hanafi and Othman, Raihan (2010) RF magnetron sputtered YSZ thin film: Fabrication and characterizations. In: 3rd International Conference on Functional Materials and Devices 2010, 13-17 June 2010, Kuala Terengganu, Terengganu, Malaysia. (Unpublished) http://umconference.um.edu.my/ICFMD2010 |
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TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion |
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TA2001 Plasma engineering. Applied plasma dynamics TJ807 Renewable energy sources TK2896 Production of electricity by direct energy conversion Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan RF magnetron sputtered YSZ thin film: Fabrication and characterizations |
description |
In order to obtain high ionic conductivity of a solid electrolyte at intermediate temperatures, a very thin dense film is crucial due to its reduced ohmic losses. This work describes the fabrication of yttria-stablized zirconia (8YSZ) thin films using radio frequency (RF) magnetron sputtering method. The thin films were deposited on carbon paint coated stainless steel foils with varying substrate temperatures (Ts) of 150, 200, 250 and 300°C, while other sputtering parameters i.e. argon gas flow rate, RF power and deposition time were fixed. The sputtering target was sintered YSZ pellets. The deposited thin films thickness ranges from 300 nm to 2 μm as determined from the scanning electron microscopy. Phase analysis using the X-ray diffraction (XRD) revealed monoclinic, tetragonal and cubic phases of zirconia, and yttria peaks. AC impedance spectroscopy was conducted to measure the bulk resistance of the thin films. Through increasing substrate temperatures, the bulk resistance decreases from 13.76 k for Ts of 150C to 1.913 k for Ts of 300C. |
format |
Conference or Workshop Item |
author |
Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan |
author_facet |
Meskon, Shahrul Razi Sutjipto, Agus Geter Edy Ani, Mohd Hanafi Othman, Raihan |
author_sort |
Meskon, Shahrul Razi |
title |
RF magnetron sputtered YSZ thin film: Fabrication and characterizations |
title_short |
RF magnetron sputtered YSZ thin film: Fabrication and characterizations |
title_full |
RF magnetron sputtered YSZ thin film: Fabrication and characterizations |
title_fullStr |
RF magnetron sputtered YSZ thin film: Fabrication and characterizations |
title_full_unstemmed |
RF magnetron sputtered YSZ thin film: Fabrication and characterizations |
title_sort |
rf magnetron sputtered ysz thin film: fabrication and characterizations |
publishDate |
2010 |
url |
http://irep.iium.edu.my/6720/ http://irep.iium.edu.my/6720/ http://irep.iium.edu.my/6720/1/ICFMD2010_Shahrul.pdf |
first_indexed |
2023-09-18T20:15:50Z |
last_indexed |
2023-09-18T20:15:50Z |
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1777407780917870592 |