An effective vision technique for microchip lead inspection
A new effective method for the microchip lead inspection for the chip manufacturing industry has been developed in this work. In contrast to the gray scale pattern matching technique this approach employs selected parameters of binary blobs to perform fault detection and measurements. This lead...
| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2003
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/6943/ http://irep.iium.edu.my/6943/1/An_Effective_Vision_Technique_for_Microchip_Lead_Inspection.pdf |
| Summary: | A new effective method for the microchip lead
inspection for the chip manufacturing industry has been
developed in this work. In contrast to the gray scale pattern
matching technique this approach employs selected
parameters of binary blobs to perform fault detection and
measurements. This leads to a significant reduction of image
processing time. A special combination of gray level filtering
techniques with gray morphological operations enhances the
borders of the lead images. Newly developed threshold
calibration technique significantly improves the measurement
accuracy. A unique statistical analysis has been developed to
identify all possible lead defects in the chips. This method is
rotationally and scale invariant and able to detect defective
leads for the chips with different specifications. The
minimum required information ahout the microchip is the
number of leads. |
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