Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics

Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen wat...

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Main Authors:	Sutjipto, Agus Geter Edy, -, Afzeri, Muhida, Riza, Mridha, Shahjahan
Format:	Conference or Workshop Item
Language:	English
Published:	2007
Subjects:	TK452 Electric apparatus and materials. Electric circuits. Electric networks
Online Access:	http://irep.iium.edu.my/9447/ http://irep.iium.edu.my/9447/1/AGUS_-_Proc_ICEEI-2007.pdf

id	iium-9447
recordtype	eprints
spelling	iium-94472012-04-06T07:22:47Z http://irep.iium.edu.my/9447/ Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics Sutjipto, Agus Geter Edy -, Afzeri Muhida, Riza Mridha, Shahjahan TK452 Electric apparatus and materials. Electric circuits. Electric networks Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen water layer covering a silicon wafer surface. A scanning probe was contacted with the layer and a zero bias voltage was applied to the probe tip. The frozen water film acted both as an electrolyte for forming the oxides and as a resource of hydroxide. Using this technique, a consistency in height of about 6 nm silicon dioxide patterns layer could be achieved. 2007-06-17 Conference or Workshop Item PeerReviewed application/pdf en http://irep.iium.edu.my/9447/1/AGUS_-_Proc_ICEEI-2007.pdf Sutjipto, Agus Geter Edy and -, Afzeri and Muhida, Riza and Mridha, Shahjahan (2007) Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics. In: International Conference on Electrical Engineering and Informatics Institut Teknologi , 17-19 June 2007, Bandung, Indonesia .
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English
topic	TK452 Electric apparatus and materials. Electric circuits. Electric networks
spellingShingle	TK452 Electric apparatus and materials. Electric circuits. Electric networks Sutjipto, Agus Geter Edy -, Afzeri Muhida, Riza Mridha, Shahjahan Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
description	Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen water layer covering a silicon wafer surface. A scanning probe was contacted with the layer and a zero bias voltage was applied to the probe tip. The frozen water film acted both as an electrolyte for forming the oxides and as a resource of hydroxide. Using this technique, a consistency in height of about 6 nm silicon dioxide patterns layer could be achieved.
format	Conference or Workshop Item
author	Sutjipto, Agus Geter Edy -, Afzeri Muhida, Riza Mridha, Shahjahan
author_facet	Sutjipto, Agus Geter Edy -, Afzeri Muhida, Riza Mridha, Shahjahan
author_sort	Sutjipto, Agus Geter Edy
title	Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
title_short	Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
title_full	Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
title_fullStr	Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
title_full_unstemmed	Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics
title_sort	novel nanofabrication process of oxide patterns using afm in low operating temperature: a promising lithographic tool for future molecular electronics
publishDate	2007
url	http://irep.iium.edu.my/9447/ http://irep.iium.edu.my/9447/1/AGUS_-_Proc_ICEEI-2007.pdf
first_indexed	2023-09-18T20:19:08Z
last_indexed	2023-09-18T20:19:08Z
_version_	1777407988781285376

Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics

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