Theoretical study of atomic level understanding of the reactive ion etching (RIE)

Theoretical study of atomic level understanding of the reactive ion etching (RIE)

We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion fro...

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Main Authors: Muhida, Rifki, Rahman, Md. Mamudur, Chowdhury, Md. Sazzad Hossien, Muhida, Riza, Zainuddin, Hishamuddin, Zakaria, Azmi, Kasai, Hideaki
Format: Article
Language:English
Published: American Scientific Publishers 2011
Subjects:
QC Physics
Online Access:http://irep.iium.edu.my/9488/
http://irep.iium.edu.my/9488/
http://irep.iium.edu.my/9488/1/acceptdoc-RIE-JCTN.pdf
id iium-9488
recordtype eprints
spelling iium-94882013-01-13T12:52:42Z http://irep.iium.edu.my/9488/ Theoretical study of atomic level understanding of the reactive ion etching (RIE) Muhida, Rifki Rahman, Md. Mamudur Chowdhury, Md. Sazzad Hossien Muhida, Riza Zainuddin, Hishamuddin Zakaria, Azmi Kasai, Hideaki QC Physics We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion from the cluster surface providing ion pentacarbonyl, i.e., Fe(CO)5. By density functional theory based first principle calculations, we calculate the potential energy surface(PES) of the system and describe the mechanism of the reaction. Based on the two chosen pathways for initial and final states, we show that the RIE processes follow the pathway that gives us minimum energy. American Scientific Publishers 2011-08-09 Article PeerReviewed application/pdf en http://irep.iium.edu.my/9488/1/acceptdoc-RIE-JCTN.pdf Muhida, Rifki and Rahman, Md. Mamudur and Chowdhury, Md. Sazzad Hossien and Muhida, Riza and Zainuddin, Hishamuddin and Zakaria, Azmi and Kasai, Hideaki (2011) Theoretical study of atomic level understanding of the reactive ion etching (RIE). Journal of Computational and Theoretical Nanoscience. ISSN 1546-1955 (P) 1546-1963 (O) (In Press) http://www.aspbs.com/ctn/
repository_type Digital Repository
institution_category Local University
institution International Islamic University Malaysia
building IIUM Repository
collection Online Access
language English
topic QC Physics
spellingShingle QC Physics
Muhida, Rifki
Rahman, Md. Mamudur
Chowdhury, Md. Sazzad Hossien
Muhida, Riza
Zainuddin, Hishamuddin
Zakaria, Azmi
Kasai, Hideaki
Theoretical study of atomic level understanding of the reactive ion etching (RIE)
description We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion from the cluster surface providing ion pentacarbonyl, i.e., Fe(CO)5. By density functional theory based first principle calculations, we calculate the potential energy surface(PES) of the system and describe the mechanism of the reaction. Based on the two chosen pathways for initial and final states, we show that the RIE processes follow the pathway that gives us minimum energy.
format Article
author Muhida, Rifki
Rahman, Md. Mamudur
Chowdhury, Md. Sazzad Hossien
Muhida, Riza
Zainuddin, Hishamuddin
Zakaria, Azmi
Kasai, Hideaki
author_facet Muhida, Rifki
Rahman, Md. Mamudur
Chowdhury, Md. Sazzad Hossien
Muhida, Riza
Zainuddin, Hishamuddin
Zakaria, Azmi
Kasai, Hideaki
author_sort Muhida, Rifki
title Theoretical study of atomic level understanding of the reactive ion etching (RIE)
title_short Theoretical study of atomic level understanding of the reactive ion etching (RIE)
title_full Theoretical study of atomic level understanding of the reactive ion etching (RIE)
title_fullStr Theoretical study of atomic level understanding of the reactive ion etching (RIE)
title_full_unstemmed Theoretical study of atomic level understanding of the reactive ion etching (RIE)
title_sort theoretical study of atomic level understanding of the reactive ion etching (rie)
publisher American Scientific Publishers
publishDate 2011
url http://irep.iium.edu.my/9488/
http://irep.iium.edu.my/9488/
http://irep.iium.edu.my/9488/1/acceptdoc-RIE-JCTN.pdf
first_indexed 2023-09-18T20:19:10Z
last_indexed 2023-09-18T20:19:10Z
_version_ 1777407990678159360

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