Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching

The fabrication of silicon nanohole (SiNH) using a combination of electron beam lithography (EBL) and reactive ion etching (RIE) processes is reported. The optimum exposure dose of EBL process was found to be in the range of 210-240 μC/cm2 due to small enlargement of hole diameter after pattern deve...

Full description

Bibliographic Details
Main Authors:	Lita Rahmasari, Mohd Faizol Abdullah, Ahmad Rifqi Md Zain, Abdul Manaf Hashim
Format:	Article
Language:	English
Published:	Penerbit Universiti Kebangsaan Malaysia 2019
Online Access:	http://journalarticle.ukm.my/13706/ http://journalarticle.ukm.my/13706/ http://journalarticle.ukm.my/13706/1/01%20Lita%20Rahmasari.pdf

id	ukm-13706
recordtype	eprints
spelling	ukm-137062019-11-29T08:54:12Z http://journalarticle.ukm.my/13706/ Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching Lita Rahmasari, Mohd Faizol Abdullah, Ahmad Rifqi Md Zain, Abdul Manaf Hashim, The fabrication of silicon nanohole (SiNH) using a combination of electron beam lithography (EBL) and reactive ion etching (RIE) processes is reported. The optimum exposure dose of EBL process was found to be in the range of 210-240 μC/cm2 due to small enlargement of hole diameter after pattern development process. The anisotropic etching and isotropic etching was achieved at low and high reaction pressures, respectively. As expected, the etching rate increase with time and RF power. A relatively smooth and well-defined NH has been obtained at RF power of 100 W and reaction pressure of 0.08 Torr, which is suitable to be applied for optical waveguide. Penerbit Universiti Kebangsaan Malaysia 2019-06 Article PeerReviewed application/pdf en http://journalarticle.ukm.my/13706/1/01%20Lita%20Rahmasari.pdf Lita Rahmasari, and Mohd Faizol Abdullah, and Ahmad Rifqi Md Zain, and Abdul Manaf Hashim, (2019) Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching. Sains Malaysiana, 48 (6). pp. 1157-1161. ISSN 0126-6039 http://www.ukm.my/jsm/malay_journals/jilid48bil6_2019/KandunganJilid48Bil6_2019.html
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Kebangasaan Malaysia
building	UKM Institutional Repository
collection	Online Access
language	English
description	The fabrication of silicon nanohole (SiNH) using a combination of electron beam lithography (EBL) and reactive ion etching (RIE) processes is reported. The optimum exposure dose of EBL process was found to be in the range of 210-240 μC/cm2 due to small enlargement of hole diameter after pattern development process. The anisotropic etching and isotropic etching was achieved at low and high reaction pressures, respectively. As expected, the etching rate increase with time and RF power. A relatively smooth and well-defined NH has been obtained at RF power of 100 W and reaction pressure of 0.08 Torr, which is suitable to be applied for optical waveguide.
format	Article
author	Lita Rahmasari, Mohd Faizol Abdullah, Ahmad Rifqi Md Zain, Abdul Manaf Hashim,
spellingShingle	Lita Rahmasari, Mohd Faizol Abdullah, Ahmad Rifqi Md Zain, Abdul Manaf Hashim, Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
author_facet	Lita Rahmasari, Mohd Faizol Abdullah, Ahmad Rifqi Md Zain, Abdul Manaf Hashim,
author_sort	Lita Rahmasari,
title	Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
title_short	Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
title_full	Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
title_fullStr	Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
title_full_unstemmed	Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
title_sort	silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching
publisher	Penerbit Universiti Kebangsaan Malaysia
publishDate	2019
url	http://journalarticle.ukm.my/13706/ http://journalarticle.ukm.my/13706/ http://journalarticle.ukm.my/13706/1/01%20Lita%20Rahmasari.pdf
first_indexed	2023-09-18T20:05:27Z
last_indexed	2023-09-18T20:05:27Z
_version_	1777407127822794752

Silicon nanohole arrays fabricated by electron beam lithography and reactive ion etching

Similar Items