Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography

Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography

In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the c...

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Main Authors: Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
Format: Article
Published: IOP Publishing 2015
Subjects:
TK Electrical engineering. Electronics Nuclear engineering
Online Access:http://umpir.ump.edu.my/id/eprint/11884/
http://umpir.ump.edu.my/id/eprint/11884/
http://umpir.ump.edu.my/id/eprint/11884/
id ump-11884
recordtype eprints
spelling ump-118842018-06-28T01:07:55Z http://umpir.ump.edu.my/id/eprint/11884/ Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography Nurhafizah, Abu Talip Hayashi, Tatsuya Taniguchi, Jun Hiwasa, Shin TK Electrical engineering. Electronics Nuclear engineering In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the complete filling of resin in a high-aspect-ratio RAF-ARS replica mold during UV-NIL, degrades its fluorinated components and consequently shortens its lifetime. In this paper, we propose a technique for the lifetime amelioration of RAF-ARS replica molds by partial-filling UV-NIL. Complete-filling UV-NIL was also executed for comparison. We also examined the effects of the filling ratio on an RAF-ARS replica mold. Using the partial-filling UV-NIL technique, we successfully prolonged the lifetime of an RAF-ARS replica mold up to the 100th imprint, compared with the 75th imprint in the case of complete-filling UV-NIL. IOP Publishing 2015 Article PeerReviewed Nurhafizah, Abu Talip and Hayashi, Tatsuya and Taniguchi, Jun and Hiwasa, Shin (2015) Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography. Japanese Journal of Applied Physics, 54 (6S1). pp. 1-7. ISSN 0021-4922 http://dx.doi.org/10.7567/JJAP.54.06FM04 DOI: 10.7567/JJAP.54.06FM04
repository_type Digital Repository
institution_category Local University
institution Universiti Malaysia Pahang
building UMP Institutional Repository
collection Online Access
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography
description In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the complete filling of resin in a high-aspect-ratio RAF-ARS replica mold during UV-NIL, degrades its fluorinated components and consequently shortens its lifetime. In this paper, we propose a technique for the lifetime amelioration of RAF-ARS replica molds by partial-filling UV-NIL. Complete-filling UV-NIL was also executed for comparison. We also examined the effects of the filling ratio on an RAF-ARS replica mold. Using the partial-filling UV-NIL technique, we successfully prolonged the lifetime of an RAF-ARS replica mold up to the 100th imprint, compared with the 75th imprint in the case of complete-filling UV-NIL.
format Article
author Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
author_facet Nurhafizah, Abu Talip
Hayashi, Tatsuya
Taniguchi, Jun
Hiwasa, Shin
author_sort Nurhafizah, Abu Talip
title Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography
title_short Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography
title_full Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography
title_fullStr Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography
title_full_unstemmed Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography
title_sort lifetime amelioration of release-agent-free antireflection-structured replica molds by partial-filling ultraviolet nanoimprint lithography
publisher IOP Publishing
publishDate 2015
url http://umpir.ump.edu.my/id/eprint/11884/
http://umpir.ump.edu.my/id/eprint/11884/
http://umpir.ump.edu.my/id/eprint/11884/
first_indexed 2023-09-18T22:12:55Z
last_indexed 2023-09-18T22:12:55Z
_version_ 1777415147701141504

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