Photo-polishing of POME into CH4-Lean Biogas over The UV-Responsive ZnO Photocatalyst
We report here the photo-polishing of POME with a concomitant production of CH4-lean biogas over UV/ZnO photocatalysis system. The photoreaction results showed that the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal after just 240 min of UV irradiation...
Main Authors: | Ng, Kim Hoong, Cheng, C. K. |
---|---|
Format: | Article |
Language: | English English |
Published: |
Elsevier
2016
|
Subjects: | |
Online Access: | http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/ http://umpir.ump.edu.my/id/eprint/12990/1/UMP-IR-Chem-Eng%20J.pdf http://umpir.ump.edu.my/id/eprint/12990/7/Photo-polishing%20of%20POME%20into%20CH4-lean%20biogas%20over%20the%20UV-responsive%20ZnO%20photocatalyst.pdf |
Similar Items
-
Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
by: Ng, K. H., et al.
Published: (2016) -
Photo-treatment of palm oil mills effluent (pome) over cu/tio2 photocatalyst
by: Ng, Kim Hoong
Published: (2013) -
A Novel Photomineralization of POME over UV-responsive TiO2 Photocatalyst: Kinetics of POME Degradation and Gaseous Product Formations
by: Kim, Hoong Ng, et al.
Published: (2015) -
An application of advanced oxidation process to photopolish palm oil mill effluent over TIO2 and ZnO photocatalysts
by: Ng, Kim Hoong
Published: (2017) -
Optimization of Photocatalytic Degradation of Palm Oil Mill Effluent in UV/ZnO system based on Response Surface Methodology
by: Ng, Kim Hoong, et al.
Published: (2016)