Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis

Cell imprint lithography (CIL) or cell replication plays a vital role in fields like biomimetic smart culture substrates, bone tissue engineering, cell guiding, cell adhesion, tissue engineering, cell microenvironments, tissue microenvironments, cell research, drug delivery, diagnostics, therapeutic...

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Main Authors: Narayanamurthy, Vigneswaran, Fahmi, Samsuri, Firus Khan, Al'aina Yuhainis, Hairul Aini, Hamzah, Madia Baizura, Baharom, Kumary, T. V., Anil Kumar, P. R., Raj, Deepa K.
Format: Article
Language:English
Published: IOP Science 2019
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Online Access:http://umpir.ump.edu.my/id/eprint/26745/
http://umpir.ump.edu.my/id/eprint/26745/
http://umpir.ump.edu.my/id/eprint/26745/
http://umpir.ump.edu.my/id/eprint/26745/1/Direct%20cell%20imprint%20lithography%20in%20superconductive%20carbon%20black%20.pdf
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spelling ump-267452020-03-12T05:59:52Z http://umpir.ump.edu.my/id/eprint/26745/ Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis Narayanamurthy, Vigneswaran Fahmi, Samsuri Firus Khan, Al'aina Yuhainis Hairul Aini, Hamzah Madia Baizura, Baharom Kumary, T. V. Anil Kumar, P. R. Raj, Deepa K. TK Electrical engineering. Electronics Nuclear engineering Cell imprint lithography (CIL) or cell replication plays a vital role in fields like biomimetic smart culture substrates, bone tissue engineering, cell guiding, cell adhesion, tissue engineering, cell microenvironments, tissue microenvironments, cell research, drug delivery, diagnostics, therapeutics and many other applications. Herein we report a new formulation of superconductive carbon black photopolymer composite and its characterization towards a CIL process technique. In this article, we demonstrated an approach of using a carbon nanoparticle-polymer composite (CPC) for patterning cells. It is observed that a 0.3 wt % load of carbon nanoparticles (CNPs) in a carbon polymer mixture (CPM) was optimal for cell-imprint replica fabrication. The electrical resistance of the 3-CPC (0.3 wt %) was reduced by 68% when compared to N-CPC (0 wt %). This method successfully replicated the single cell with sub-organelle scale. The shape of microvesicles, grooves, pores, blebs or microvilli on the cellular surface was patterned clearly. This technique delivers a free-standing cell feature substrate. In vitro evaluation of the polymer demonstrated it as an ideal candidate for biomimetic biomaterial applications. This approach also finds its application in study based on morphology, especially for drug delivery applications and for investigations based on molecular pathways. IOP Science 2019-11-06 Article PeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/26745/1/Direct%20cell%20imprint%20lithography%20in%20superconductive%20carbon%20black%20.pdf Narayanamurthy, Vigneswaran and Fahmi, Samsuri and Firus Khan, Al'aina Yuhainis and Hairul Aini, Hamzah and Madia Baizura, Baharom and Kumary, T. V. and Anil Kumar, P. R. and Raj, Deepa K. (2019) Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis. Bioinspiration & Biomimetics, 15 (016002). pp. 1-19. ISSN 1748-3190 https://doi.org/10.1088/1748-3190/ab1243 https://doi.org/10.1088/1748-3190/ab1243
repository_type Digital Repository
institution_category Local University
institution Universiti Malaysia Pahang
building UMP Institutional Repository
collection Online Access
language English
topic TK Electrical engineering. Electronics Nuclear engineering
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Narayanamurthy, Vigneswaran
Fahmi, Samsuri
Firus Khan, Al'aina Yuhainis
Hairul Aini, Hamzah
Madia Baizura, Baharom
Kumary, T. V.
Anil Kumar, P. R.
Raj, Deepa K.
Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis
description Cell imprint lithography (CIL) or cell replication plays a vital role in fields like biomimetic smart culture substrates, bone tissue engineering, cell guiding, cell adhesion, tissue engineering, cell microenvironments, tissue microenvironments, cell research, drug delivery, diagnostics, therapeutics and many other applications. Herein we report a new formulation of superconductive carbon black photopolymer composite and its characterization towards a CIL process technique. In this article, we demonstrated an approach of using a carbon nanoparticle-polymer composite (CPC) for patterning cells. It is observed that a 0.3 wt % load of carbon nanoparticles (CNPs) in a carbon polymer mixture (CPM) was optimal for cell-imprint replica fabrication. The electrical resistance of the 3-CPC (0.3 wt %) was reduced by 68% when compared to N-CPC (0 wt %). This method successfully replicated the single cell with sub-organelle scale. The shape of microvesicles, grooves, pores, blebs or microvilli on the cellular surface was patterned clearly. This technique delivers a free-standing cell feature substrate. In vitro evaluation of the polymer demonstrated it as an ideal candidate for biomimetic biomaterial applications. This approach also finds its application in study based on morphology, especially for drug delivery applications and for investigations based on molecular pathways.
format Article
author Narayanamurthy, Vigneswaran
Fahmi, Samsuri
Firus Khan, Al'aina Yuhainis
Hairul Aini, Hamzah
Madia Baizura, Baharom
Kumary, T. V.
Anil Kumar, P. R.
Raj, Deepa K.
author_facet Narayanamurthy, Vigneswaran
Fahmi, Samsuri
Firus Khan, Al'aina Yuhainis
Hairul Aini, Hamzah
Madia Baizura, Baharom
Kumary, T. V.
Anil Kumar, P. R.
Raj, Deepa K.
author_sort Narayanamurthy, Vigneswaran
title Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis
title_short Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis
title_full Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis
title_fullStr Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis
title_full_unstemmed Direct cell imprint lithography in superconductive carbon black polymer composites: Process optimization, characterization and in vitro toxicity analysis
title_sort direct cell imprint lithography in superconductive carbon black polymer composites: process optimization, characterization and in vitro toxicity analysis
publisher IOP Science
publishDate 2019
url http://umpir.ump.edu.my/id/eprint/26745/
http://umpir.ump.edu.my/id/eprint/26745/
http://umpir.ump.edu.my/id/eprint/26745/
http://umpir.ump.edu.my/id/eprint/26745/1/Direct%20cell%20imprint%20lithography%20in%20superconductive%20carbon%20black%20.pdf
first_indexed 2023-09-18T22:41:50Z
last_indexed 2023-09-18T22:41:50Z
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