UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction

Fouling of natural organic matter is one of the common problems in water treatment plant. Despite physical and chemical treatment normally used to recover the flux loss, membrane surface properties also not less important to be considered. In this study, UV-photografting technique was applied to mod...

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Main Authors:	Mazrul Nizam, Abu Seman, Nidal, Hilal, M., Khayet
Format:	Article
Language:	English
Published:	Taylor & Francis 2013
Subjects:	TP Chemical technology
Online Access:	http://umpir.ump.edu.my/id/eprint/6823/ http://umpir.ump.edu.my/id/eprint/6823/ http://umpir.ump.edu.my/id/eprint/6823/ http://umpir.ump.edu.my/id/eprint/6823/1/UV-photografting_modification_of_NF_membrane_surface_for_NOM_wfouling_reduction.pdf

id	ump-6823
recordtype	eprints
spelling	ump-68232018-02-07T07:05:17Z http://umpir.ump.edu.my/id/eprint/6823/ UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction Mazrul Nizam, Abu Seman Nidal, Hilal M., Khayet TP Chemical technology Fouling of natural organic matter is one of the common problems in water treatment plant. Despite physical and chemical treatment normally used to recover the flux loss, membrane surface properties also not less important to be considered. In this study, UV-photografting technique was applied to modify commercial nanofiltration (NF) membrane surface in order to reduce fouling tendency. Neutral hydrophilic N-vinylpyrrolidone has been chosen as the monomer for the UV-photografting. The result revealed that the grafted membrane at optimum conditions exhibits low humic acid fouling tendency compared with the unmodified membrane. In addition, both the unmodified and the UV-grafted polyethersulfone NF membranes were characterized in terms of structural properties (pore size, rp, and ratio of membrane thickness to porosity, Dx/Ak) using Pore Model in order to evaluate the effect of UV-photografting modification on structural parameters and indirectly influence the membrane performance and fouling as well. Taylor & Francis 2013 Article PeerReviewed application/pdf en cc_by http://umpir.ump.edu.my/id/eprint/6823/1/UV-photografting_modification_of_NF_membrane_surface_for_NOM_wfouling_reduction.pdf Mazrul Nizam, Abu Seman and Nidal, Hilal and M., Khayet (2013) UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction. Desalination and Water Treatment, 51 (25-27). pp. 4855-4861. ISSN 1944-3994 http://dx.doi.org/10.1080/19443994.2013.774113 DOI:10.1080/19443994.2013.774113
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Malaysia Pahang
building	UMP Institutional Repository
collection	Online Access
language	English
topic	TP Chemical technology
spellingShingle	TP Chemical technology Mazrul Nizam, Abu Seman Nidal, Hilal M., Khayet UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction
description	Fouling of natural organic matter is one of the common problems in water treatment plant. Despite physical and chemical treatment normally used to recover the flux loss, membrane surface properties also not less important to be considered. In this study, UV-photografting technique was applied to modify commercial nanofiltration (NF) membrane surface in order to reduce fouling tendency. Neutral hydrophilic N-vinylpyrrolidone has been chosen as the monomer for the UV-photografting. The result revealed that the grafted membrane at optimum conditions exhibits low humic acid fouling tendency compared with the unmodified membrane. In addition, both the unmodified and the UV-grafted polyethersulfone NF membranes were characterized in terms of structural properties (pore size, rp, and ratio of membrane thickness to porosity, Dx/Ak) using Pore Model in order to evaluate the effect of UV-photografting modification on structural parameters and indirectly influence the membrane performance and fouling as well.
format	Article
author	Mazrul Nizam, Abu Seman Nidal, Hilal M., Khayet
author_facet	Mazrul Nizam, Abu Seman Nidal, Hilal M., Khayet
author_sort	Mazrul Nizam, Abu Seman
title	UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction
title_short	UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction
title_full	UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction
title_fullStr	UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction
title_full_unstemmed	UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction
title_sort	uv-photografting modification of nf membrane surface for nom wfouling reduction
publisher	Taylor & Francis
publishDate	2013
url	http://umpir.ump.edu.my/id/eprint/6823/ http://umpir.ump.edu.my/id/eprint/6823/ http://umpir.ump.edu.my/id/eprint/6823/ http://umpir.ump.edu.my/id/eprint/6823/1/UV-photografting_modification_of_NF_membrane_surface_for_NOM_wfouling_reduction.pdf
first_indexed	2023-09-18T22:02:56Z
last_indexed	2023-09-18T22:02:56Z
_version_	1777414519568465920

UV-Photografting Modification of NF Membrane Surface for NOM wfouling Reduction

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