Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication

Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication

Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using optical emission spectroscopy and Langmuir probe. The intensity of the light emission from atoms and radicals in the plasma were measured using optical emission spectroscopy (OES). Then, Langmuir pro...

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Bibliographic Details
Main Authors: Ahmad Faizal, Mohd Zain, Jia, Wei Low, Nafarizal, Nayan, Mohd Zainizan, Sahdan, Mohd Khairul, Ahmad, Ali Yeon, Md Shakaff, Ammar, Zakaria
Format: Article
Language:English
Published: Penerbit Universiti Teknologi Malaysia 2015
Subjects:
TS Manufactures
Online Access:http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/1/Spectroscopic%20Studies%20of%20Magnetron%20Sputtering%20Plasma%20Discharge%20in%20Cu%20O2%20Ar%20Mixture%20for%20Copper%20Oxide%20Thin%20Film%20Fabrication.pdf

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http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/
http://umpir.ump.edu.my/id/eprint/8790/1/Spectroscopic%20Studies%20of%20Magnetron%20Sputtering%20Plasma%20Discharge%20in%20Cu%20O2%20Ar%20Mixture%20for%20Copper%20Oxide%20Thin%20Film%20Fabrication.pdf

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