Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong rel...

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Main Authors:	Nurhafizah, Abu Talip, Hayashi, Tatsuya, Tanighuchi, Jun, Hiwasa, Shin
Format:	Conference or Workshop Item
Language:	English
Published:	2015
Subjects:	TK Electrical engineering. Electronics Nuclear engineering
Online Access:	http://umpir.ump.edu.my/id/eprint/9274/ http://umpir.ump.edu.my/id/eprint/9274/ http://umpir.ump.edu.my/id/eprint/9274/1/fkee-2015-nurhafizah-Lifetime%20prolongation%281%29.pdf

id	ump-9274
recordtype	eprints
spelling	ump-92742018-06-28T01:08:56Z http://umpir.ump.edu.my/id/eprint/9274/ Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography Nurhafizah, Abu Talip Hayashi, Tatsuya Tanighuchi, Jun Hiwasa, Shin TK Electrical engineering. Electronics Nuclear engineering Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the release agent and shortens the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, prolong the lifetime of the release agent on ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the release agent on the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to 75th imprint compared to complete-filling UV-NIL up to the 40th imprint. 2015 Conference or Workshop Item PeerReviewed application/pdf en http://umpir.ump.edu.my/id/eprint/9274/1/fkee-2015-nurhafizah-Lifetime%20prolongation%281%29.pdf Nurhafizah, Abu Talip and Hayashi, Tatsuya and Tanighuchi, Jun and Hiwasa, Shin (2015) Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography. In: Proceedings of the International Conference on Electronic Packaging and iMAPS All Asia Conference (ICEP-IACC 2015), 14-17 April 2015 , Kyoto, Japan. pp. 418-421.. http://dx.doi.org/10.1109/ICEP-IAAC.2015.7111048
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Malaysia Pahang
building	UMP Institutional Repository
collection	Online Access
language	English
topic	TK Electrical engineering. Electronics Nuclear engineering
spellingShingle	TK Electrical engineering. Electronics Nuclear engineering Nurhafizah, Abu Talip Hayashi, Tatsuya Tanighuchi, Jun Hiwasa, Shin Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
description	Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the release agent and shortens the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, prolong the lifetime of the release agent on ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the release agent on the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to 75th imprint compared to complete-filling UV-NIL up to the 40th imprint.
format	Conference or Workshop Item
author	Nurhafizah, Abu Talip Hayashi, Tatsuya Tanighuchi, Jun Hiwasa, Shin
author_facet	Nurhafizah, Abu Talip Hayashi, Tatsuya Tanighuchi, Jun Hiwasa, Shin
author_sort	Nurhafizah, Abu Talip
title	Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_short	Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_full	Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_fullStr	Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_full_unstemmed	Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography
title_sort	lifetime prolongation of release agent on antireflection structure molds by means of partial-filling ultraviolet nanoimprint lithography
publishDate	2015
url	http://umpir.ump.edu.my/id/eprint/9274/ http://umpir.ump.edu.my/id/eprint/9274/ http://umpir.ump.edu.my/id/eprint/9274/1/fkee-2015-nurhafizah-Lifetime%20prolongation%281%29.pdf
first_indexed	2023-09-18T22:07:41Z
last_indexed	2023-09-18T22:07:41Z
_version_	1777414817616756736

Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

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