Quality of copper film electroplated on silicon wafer using different current densities

Bibliographic Details
Main Author:	Mridha, Shahjahan
Format:	Book Chapter
Language:	English
Published:	IIUM Press 2011
Subjects:	TP1080 Polymers, plastics and their manufacture
Online Access:	http://irep.iium.edu.my/19027/ http://irep.iium.edu.my/19027/ http://irep.iium.edu.my/19027/1/Chapter_6.pdf

id	iium-19027
recordtype	eprints
spelling	iium-190272012-09-21T08:14:26Z http://irep.iium.edu.my/19027/ Quality of copper film electroplated on silicon wafer using different current densities Mridha, Shahjahan TP1080 Polymers, plastics and their manufacture IIUM Press 2011 Book Chapter PeerReviewed application/pdf en http://irep.iium.edu.my/19027/1/Chapter_6.pdf Mridha, Shahjahan (2011) Quality of copper film electroplated on silicon wafer using different current densities. In: Advances in materials engineering. IIUM Press, Kuala Lumpur, pp. 28-38. ISBN 9789674181673 http://rms.research.iium.edu.my/bookstore/default.aspx
repository_type	Digital Repository
institution_category	Local University
institution	International Islamic University Malaysia
building	IIUM Repository
collection	Online Access
language	English
topic	TP1080 Polymers, plastics and their manufacture
spellingShingle	TP1080 Polymers, plastics and their manufacture Mridha, Shahjahan Quality of copper film electroplated on silicon wafer using different current densities
format	Book Chapter
author	Mridha, Shahjahan
author_facet	Mridha, Shahjahan
author_sort	Mridha, Shahjahan
title	Quality of copper film electroplated on silicon wafer using different current densities
title_short	Quality of copper film electroplated on silicon wafer using different current densities
title_full	Quality of copper film electroplated on silicon wafer using different current densities
title_fullStr	Quality of copper film electroplated on silicon wafer using different current densities
title_full_unstemmed	Quality of copper film electroplated on silicon wafer using different current densities
title_sort	quality of copper film electroplated on silicon wafer using different current densities
publisher	IIUM Press
publishDate	2011
url	http://irep.iium.edu.my/19027/ http://irep.iium.edu.my/19027/ http://irep.iium.edu.my/19027/1/Chapter_6.pdf
first_indexed	2023-09-18T20:28:21Z
last_indexed	2023-09-18T20:28:21Z
_version_	1777408567989501952

Quality of copper film electroplated on silicon wafer using different current densities

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