Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation depen...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Trans Tech Publications, Switzerland
2013
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf |