Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching
A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation depen...
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Trans Tech Publications, Switzerland
2013
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| Online Access: | http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf |
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iium-28378 |
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iium-283782013-02-19T05:12:25Z http://irep.iium.edu.my/28378/ Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching Za'bah, Nor Farahidah Kwa, Kelvin S. K. O'Neill, Anthony QD Chemistry TS Manufactures A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation dependent etching using potassium hydroxide (KOH) and Tetra-Methyl Ammonium Hydroxide (TMAH) are presented in this paper. Based on the etching experiments using silicon substrates, KOH with added isopropyl alcohol (IPA) had shown to have a consistent etch rate with acceptable silicon surface roughness as compared with its other counterparts. The concern regarding the effect of line edge roughness (LER) as a result of optical lithography was highlighted and, therefore, the optimization of the patterning procedure was also discussed and presented. Trans Tech Publications, Switzerland 2013 Article PeerReviewed application/pdf en http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf Za'bah, Nor Farahidah and Kwa, Kelvin S. K. and O'Neill, Anthony (2013) Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching. Advanced Materials Research, 629. pp. 115-121. ISSN 1022-6680 http://www.scientific.net/AMR.629.115 |
| repository_type |
Digital Repository |
| institution_category |
Local University |
| institution |
International Islamic University Malaysia |
| building |
IIUM Repository |
| collection |
Online Access |
| language |
English |
| topic |
QD Chemistry TS Manufactures |
| spellingShingle |
QD Chemistry TS Manufactures Za'bah, Nor Farahidah Kwa, Kelvin S. K. O'Neill, Anthony Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching |
| description |
A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent
etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for
the optimization of the process flow especially on the orientation dependent etching using potassium hydroxide
(KOH) and Tetra-Methyl Ammonium Hydroxide (TMAH) are presented in this paper. Based on the etching
experiments using silicon substrates, KOH with added isopropyl alcohol (IPA) had shown to have a consistent etch
rate with acceptable silicon surface roughness as compared with its other counterparts. The concern regarding the
effect of line edge roughness (LER) as a result of optical lithography was highlighted and, therefore, the optimization
of the patterning procedure was also discussed and presented. |
| format |
Article |
| author |
Za'bah, Nor Farahidah Kwa, Kelvin S. K. O'Neill, Anthony |
| author_facet |
Za'bah, Nor Farahidah Kwa, Kelvin S. K. O'Neill, Anthony |
| author_sort |
Za'bah, Nor Farahidah |
| title |
Optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching |
| title_short |
Optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching |
| title_full |
Optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching |
| title_fullStr |
Optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching |
| title_full_unstemmed |
Optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching |
| title_sort |
optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching |
| publisher |
Trans Tech Publications, Switzerland |
| publishDate |
2013 |
| url |
http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf |
| first_indexed |
2023-09-18T20:41:52Z |
| last_indexed |
2023-09-18T20:41:52Z |
| _version_ |
1777409419158487040 |