Theoretical study of atomic level understanding of the reactive ion etching (RIE)

Theoretical study of atomic level understanding of the reactive ion etching (RIE)

We consider cluster model of FeNi4 cluster (as material target) where Fe ion is surrounded by four Ni ions in order to understand the mechanisms involved in the reactive ion etching (RIE) processes on magnetic surfaces(e.g., FeNi surface). By considering CO ions as reactive gases, we etch Fe ion fro...

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Bibliographic Details
Main Authors: Muhida, Rifki, Rahman, Md. Mamudur, Chowdhury, Md. Sazzad Hossien, Muhida, Riza, Zainuddin, Hishamuddin, Zakaria, Azmi, Kasai, Hideaki
Format: Article
Language:English
Published: American Scientific Publishers 2012
Subjects:
QC Physics
Online Access:http://irep.iium.edu.my/28502/
http://irep.iium.edu.my/28502/
http://irep.iium.edu.my/28502/
http://irep.iium.edu.my/28502/1/Theoretical_Study_of_Atomic_Level_Understanding_of_the_Reactive_Ion_Etching_%28RIE%29.pdf

Internet

http://irep.iium.edu.my/28502/
http://irep.iium.edu.my/28502/
http://irep.iium.edu.my/28502/
http://irep.iium.edu.my/28502/1/Theoretical_Study_of_Atomic_Level_Understanding_of_the_Reactive_Ion_Etching_%28RIE%29.pdf

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