The study on the aspect ratio of Atomic Force Microscope (AFM) measurements for Triangular Silicon Nanowire
A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching (ODE) has been developed using <100> Silicon-on Insulator (SOI) as the starting substrate. The use of ODE etchant such as potassium hydroxide (KOH) and Tetra-Methyl Ammonium H...
| Main Authors: | , , |
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| Format: | Conference or Workshop Item |
| Language: | English English |
| Published: |
2013
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/33715/ http://irep.iium.edu.my/33715/ http://irep.iium.edu.my/33715/1/1569793019_The_Study_on_the_Aspect_Ratio_of_AFM_Measurements_for_Triangular_Si_NW.pdf http://irep.iium.edu.my/33715/4/IEEE-presentation_schedule.pdf |