Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography

One of the most crucial challenges in lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Processing steps may change the nature of alignment mark. Either the mark is deformed or the mark proﬁle is asymmetric, a change...

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Main Authors:	Normah Ahmad, Uda Hashim, Mohd Jeffery Manaf, Kadir Ibrahim Abdul Wahab
Format:	Article
Language:	English
Published:	2007
Online Access:	http://journalarticle.ukm.my/1459/ http://journalarticle.ukm.my/1459/ http://journalarticle.ukm.my/1459/1/2007-Article_2_K-19.pdf

id	ukm-1459
recordtype	eprints
spelling	ukm-14592016-12-14T06:29:31Z http://journalarticle.ukm.my/1459/ Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography Normah Ahmad, Uda Hashim, Mohd Jeffery Manaf, Kadir Ibrahim Abdul Wahab, One of the most crucial challenges in lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Processing steps may change the nature of alignment mark. Either the mark is deformed or the mark proﬁle is asymmetric, a change in the nature of alignment mark may affect its generated signal behavior. Hence, the objective of this work is to choose a robust alignment mark so that even though there is an extreme process variation, the alignment process still produced reliable alignment accuracy. Unreliable alignment accuracy increased the rework rate, lowered the yield, and eventually may lead to device failure. In this work, several type of alignment mark was evaluated over a range of process variation. From this set of evaluated alignment marks, B2 is the most robust alignment mark within the speciﬁed process variation 2007 Article PeerReviewed application/pdf en http://journalarticle.ukm.my/1459/1/2007-Article_2_K-19.pdf Normah Ahmad, and Uda Hashim, and Mohd Jeffery Manaf, and Kadir Ibrahim Abdul Wahab, (2007) Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography. Jurnal Kejuruteraan, 19 . pp. 17-28. http://www.ukm.my/jkukm/index.php/jkukm
repository_type	Digital Repository
institution_category	Local University
institution	Universiti Kebangasaan Malaysia
building	UKM Institutional Repository
collection	Online Access
language	English
description	One of the most crucial challenges in lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Processing steps may change the nature of alignment mark. Either the mark is deformed or the mark proﬁle is asymmetric, a change in the nature of alignment mark may affect its generated signal behavior. Hence, the objective of this work is to choose a robust alignment mark so that even though there is an extreme process variation, the alignment process still produced reliable alignment accuracy. Unreliable alignment accuracy increased the rework rate, lowered the yield, and eventually may lead to device failure. In this work, several type of alignment mark was evaluated over a range of process variation. From this set of evaluated alignment marks, B2 is the most robust alignment mark within the speciﬁed process variation
format	Article
author	Normah Ahmad, Uda Hashim, Mohd Jeffery Manaf, Kadir Ibrahim Abdul Wahab,
spellingShingle	Normah Ahmad, Uda Hashim, Mohd Jeffery Manaf, Kadir Ibrahim Abdul Wahab, Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
author_facet	Normah Ahmad, Uda Hashim, Mohd Jeffery Manaf, Kadir Ibrahim Abdul Wahab,
author_sort	Normah Ahmad,
title	Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
title_short	Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
title_full	Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
title_fullStr	Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
title_full_unstemmed	Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
title_sort	characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
publishDate	2007
url	http://journalarticle.ukm.my/1459/ http://journalarticle.ukm.my/1459/ http://journalarticle.ukm.my/1459/1/2007-Article_2_K-19.pdf
first_indexed	2023-09-18T19:33:23Z
last_indexed	2023-09-18T19:33:23Z
_version_	1777405110615277568

Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography

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